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Volumn 127, Issue 2-3, 2000, Pages 238-245
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Effect of deposition conditions on internal stresses and microstructure of reactively sputtered tungsten nitride films
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Author keywords
Microstructure; Reactive magnetron sputtering; Stress; Thin films; Tungsten nitride
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Indexed keywords
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EID: 1842582582
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/s0257-8972(00)00664-2 Document Type: Article |
Times cited : (6)
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References (20)
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