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Volumn 127, Issue 2-3, 2000, Pages 238-245

Effect of deposition conditions on internal stresses and microstructure of reactively sputtered tungsten nitride films

Author keywords

Microstructure; Reactive magnetron sputtering; Stress; Thin films; Tungsten nitride

Indexed keywords


EID: 1842582582     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0257-8972(00)00664-2     Document Type: Article
Times cited : (6)

References (20)
  • 13
    • 0040978936 scopus 로고
    • PhD Thesis, University of Sydney
    • G.M. Turner, PhD Thesis, University of Sydney, 1991.
    • (1991)
    • Turner, G.M.1
  • 15
    • 0010063965 scopus 로고
    • M. Bauccio. Metals Park, OH: American Society for Metals
    • Bauccio M. ASM Metals Reference Book. 1994;American Society for Metals, Metals Park, OH.
    • (1994) ASM Metals Reference Book


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.