Optimization of a 65nm Alternating Phase Shift Quartz Etch Process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 66-75

  Anderson, Scott A ^a   Anderson, Rex B ^a   Buie, Melisa J ^a   Chandrachood, Madhavi ^a   Clevenger, Jason O ^a   Lee, Yvette ^a   Sandlin, Nicole ^a   Ding, Jian ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Micro trenching; Quartz etch; RIE Lag

Indexed keywords

BOUNDARY CONDITIONS; ETCHING; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; QUARTZ; STATISTICAL METHODS; TRENCHING;

MICTR-TRENCHING; QUARTZ ETCH; RIE LAG;

PHASE SHIFT;

EID: 1842580495     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518231     Document Type: Conference Paper

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