Improvements in Binary Chrome CD Performance Utilizing an Optimized 4th-Generation Reactor Platform

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 736-743

  Plumhoff, J ^a   Constantine, C ^a   Shin, J ^a   Reelfs, B ^a   Rausa, E ^a  

^a Unaxis USA Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHROMIUM; DRY ETCHING; LOADING; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; PLASMAS; RESEARCH AND DEVELOPMENT MANAGEMENT; STATISTICAL METHODS;

GAS COMPOSITION; PHOTOMASKS;

MASKS;

EID: 1842474952     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518138     Document Type: Conference Paper

References (4)

1. H. J. Kwon, et al. "Dry etching of Cr layer and its loading effect", Proc. SPIE 4409, pp. 382-389, 2001.
2. J. Y. Lee, et al., "Analysis of dry etch loading effect in mask fabrication", Proc. SPIE 4562, pp. 609-615, 2002.
3. J. Schneider, et al., "Compensation of long range process effects on photomasks by design data correction", Proc. SPIE 4889, pp. 59-66 2002.
4. W. Tsai, et al., U.S. Patent #6,485,869