Corrosion protection by chemical vapor deposition: A review

Corrosion Reviews

Volumn 23, Issue 4-6, 2005, Pages 355-370

  Sathiyanarayanan, S ^a   Rajagopal, G ^a   Palaniswamy, N ^a   Raghavan, M ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; CORROSION RESISTANCE; MICROSTRUCTURE; THERMODYNAMICS; TITANIUM CARBIDE; TITANIUM NITRIDE;

LIQUID DIP COATING; MATERIAL DEGRADATION; SUPERFICIAL LAYERS; WEAR PROTECTION;

CORROSION PROTECTION;

CHEMICAL VAPOR DEPOSITION; COATING; CORROSION PROTECTION;

EID: 18344387006     PISSN: 03346005     EISSN: None     Source Type: Journal    
DOI: 10.1515/corrrev.2005.23.4-5-6.355     Document Type: Review

References (90)

1. C.F. Powell, I.E. Campbell and B.W. Gonser, Vapor Plating, Electrochemical Society, John Wiley & Sons Inc., N.Y., 1955.
2. J.M. Blocher, Jr., CVD in Deposition Technologies for Films and Coatings, R.F. Bunshah et al. (Eds.), Noyes, N.J., U.S.A., 1982; p. 335.
3. J.O. Carlsson, CVD in Deposition Technologies for Films and Coatings, R.F. Bunshah et al. (Eds.), Noyes, N.J., U.S.A., 1994; p. 374.
4. H.O. Pierson, Handbook of CVD, Noyes, N.J., U.S.A., 1992.
5. M.G. Hocking, V. Vasantrasree and P.S. Sidky, Metallic and Ceramic Coatings, Longman Scientific & Technical/John Wiley & Sons Inc., N.Y., 1989.
6. T.T. Kodas and M.J. Hampden-Smith, The Chemistry of Metal, CVD, VCH, N.Y., 1994.
7. A. Kempster, Trans. IMP, 76 (6), B88 (1998).
8. C. Bernard, Proc. 8th Intl. Conf., J.M. Blocher and G.E. Vuillard (Eds.), 1981; p. 3.
9. R. Colmet et al., Proc. 8th Intl. Conf., J.M. Blocher and G.E. Vuillard (Eds.), 1981; p. 17.
10. L. Vandenbulcke, Proc. 8th Intl. Conf., J.M. Blocher and G.E. Vuillard (Eds.), 1981; p. 32.
11. T.M. Besmann and K.E. Spear, J. Electrochem. Soc., 124 (5), 790 (1977).
12. L. Hunt and E. Sirtl, J. Electrochem. Soc., 119, 1771 (1972).
13. H. Schafer, Chemical Transport Reactions, Academic Press, N.Y., 1964.
14. J.H.E. Jeffes, J. Cryst. Growth, 3, 13 (1968).
15. F. Rosenberger, Proc. 10th International Conference on CVD, Pennington, N.J., 1987; p. 11.
16. C. Bernard and R. Madan, Surf. Coat. & Technol., 49, 208 (1991).
17. M.E. Jones and D.E. Shaw, "Growth from the vapour", in: Treatise on Solid State Chemistry, Vol. 5, Plenum Press, N.Y., 1975.
18. M.M. Faktor and I. Garrett, Growth of Crystals from the Vapour, Chapman & Hall, London, 1974.
19. T.M. Besmann and K.E. Spear, J. Electrochem. Soc., 124, 786 (1977).
20. C.F. Wan and K.E. Spear, Proc. 6th Intl. Conf. on CVD, Electrochem. Soc., Princeton, N.J., 1977; p. 47.
21. M. Ducarroir and C. Bernard, Proc. 5th Intl. Conf. on CVD, Electrochem. Soc., Princeton, N.J., 1975; p. 72.
22. M. Ducarroir and C. Bernard, J. Electrochem. Soc., 123, 136 (1976).
23. K.E. Spear, Thermodynamical modeling of steady state CVD process, in: Proc. 9th Intl. Conf. on CVD, Electrochem. Soc., Princeton, N.J., 1984; p. 81.
24. P.E. Gruber, Proc. 2nd Intl. Conf. on CVD, J.M. Blocher Jr. and J.C. Withers (Eds.), 1970; p. 25.
25. J.M. Blocher, in: Chemical Vapour Deposition, B.E. Jacobson and R.F. Bunshah (Eds.), Sweden, 1982.
26. B.C. Smoak Jr. and D. O'Ferrel, Semiconductor International, 1990; p. 88.
27. J.L. Zilko, Metallo-organic CVD technology and equipment, in: Handbook of Thin-Film Deposition Process and Techniques, K.K. Shuegraf (Ed.), Noyes Publications, 1988.
28. K. Nakamura, J. Electrochem. Soc., 133 (6), 1120 (1986).
29. J.R. Hollahan and R.S. Rosler, Plasma deposition of inorganic thin films, in: Thin Film Processes, J. Vossen and W. Kern (Eds.), Academic Press, N.Y., 1978.
30. P.K. Bachman, G. Gartner and H. Lydtin, Plasma assisted CVD processes, MRS Bulletin, 51-59 (1988).
31. D. Kuppers, Proc. 7th Intl. Conf. on CVD, Electrochem. Soc., Princeton, N.J., 1979.
32. T.D. Bonifield, in: Deposition Technologies for Films and Coatings, R.F. Bunshah (Ed.), Noyes, N.J., 1982; p. 365.
33. A.R. Reinberg, Ann. Rev. Mat. Sci., 9, 341 (1979).
34. M.S. Rand, J. Vac. Sci. & Technol., 16, 420 (1979).
35. A. Sherman, Plasma enhanced CVD, in: Handbook of Deposition Technologies for Films and Coatings, R.F. Bunshah (Ed.), 2nd Ed., Noyes, N.J., 1994; p. 434.
36. D. Bauerle, Laser induced CVD, in: Laser Processing and Diagnostics, D. Bauerle (Ed.), Springer-Verlag, New York, 1984.
37. F. Shaapur and S.D. Allen, Surf. & Coat. Technol., 33, 491 (1987).
38. K.F. Jensen, Proc. 9th Intl. Conf. on CVD, Pennington, 1984; p. 3.
39. H.K. Moffat and K.F. Jensen, J. Electrochem. Soc., 135, 459 (1988).
40. H. Rebenne and R. Pollard, J. Electrochem. Soc., 132, 1932 (1985).
41. C. Menezes, C. Fortmann and S. Casey, J. Electrochem. Soc., 132 (3), 709 (1985).
42. C. Houtman, D.B. Graves and K.F. Jensen, J. Electrochem. Soc., 133 (5), 961 (1986).
43. M.E. Coltrin, R.J. Kee and J.A. Miller, J. Electrochem. Soc., 133 (6), 1206 (1986).
44. T.R. Hayes, J.F. Evans and T.W. Rusch, J. Vac. Sci. & Technol., A3 (4), 1768 (1985).
45. C.L. Remiller, Proc. 9th Intl. Conf. on CVD, Pennington, 1984; p. 21.
46. L.F. Pocket, P. Howard and S. Safaie, Surf. Coat.Technol., 94-5 (1-3), 70 (1997).
47. J.W. Dini, Mater. Manuf. Process, 12 (3), 437 (1997).
48. A. Kar and J. Mazumder, Mater. Sci. Eng. Bu. Solid State M., 41 (3), 368 (1996).
49. R. Morancho, J.A. Petit, F. Dabosi and G. Constent, Proc. 7th Intl. Conf. on CVD, Princeton, N.J., 1979; p. 593.
50. H. Hintermann, Engineering Ceramics, Sterling Publications, London, 1988; pp. 54-59.
51. A. Derre, M. Ducarroir and F. Teyssandig, Proc. 10th Intl. Conf. on CVD, Pennington, N.J., 1987; p. 1190.
52. W. Ruppert, Proc. 2nd Intl. Conf. on CVD, 1970, p. 443.
53. N.J. Archer, Proc. 5th Intl. Conf. on CVD, 1975; p. 556.
54. I. Campbell and E. Sherwood, High Temperature Materials & Technologies, John Wiley & Sons, N.Y., 1967.
55. J. Gluszek, J. Masalski, P. Furman and K. Nitsch, Biomaterials, 18 (11), 789 (1997).
56. A.M. Brown, J. Graham, K.G. Sannders and P.L. Surman, Corr. Sci., 18, 337 (1978).
57. J. Graham, High Temp. & High Pressure, 6, 577 (1974).
58. M.J. Bernet, M.R. Houlton and R.W.M. Hawes, Corr. Sci., 22 (2), 111 (1982).
59. S. Zirinsky and E.A. Irene, J. Electrochem. Soc., 124 (2), 305 (1978).
60. F.S. Galasso, R.D. Veltri and W.J. Cros, Am. Ceram. Soc. Bull., 57 (4), 453 (1978).
61. T. Taniuchi, T. Adachi and K. Kobayashi, Surf. Coat. Tech., 49, 13 (1998).
62. A. Abba, A. Galerie and M. Caillet, Oxid. Met., 17 (1), 43 (1982).
63. T. Yoshioka, H. Ukegawa, H. Kerwai, N. Fukita and T. Igarashi, Surf. Coat. Tech., 49, 97 (1991).
64. T. Goto, H. Homma, T. Hirai, T. Narushima and Y. Iguchi, High Temp. Cor. An., 98 (9), 395 (1998).
65. D.Y. Song, S. Kitalka and H. Kawamoto, J. Mater. Sci., 33 (4), 1031 (1998).
66. T. Nakagawa, M. Hara and K. Imai, J. Jpn. Inst. Metal, 61 (11), 1241 (1997).
67. E. Otero, A. Pardo, F.J. Perez, J.F. Alwarez and M.V. Utrilla, Corros. Sci., 39 (1), 133 (1997).
68. H. Gass and H.E. Hintlemann, Proc. 4th Intl. Conf. on CVD, G.F. Wakefield and I.M. Blocher (Eds.), Electrochem. Soc., Princeton, N.J., 1974.
69. T. Takahashi and H. Itoh, J. Mat. Sci., 14 (6), 1285 (1979).
70. Dong Soo Baik, Moo Sling Kim and S. John, 9th Intl. Conf. on CVD, Pennington, 1984; p. 745.
71. T. Takahashi and H. Itoh, J. Electrochem. Soc., 124 (5), 797 (1977).
72. H.F. Rebenne and D.G. Bhat, Surf. Coat. Tech., 63, 1 (1994).
73. M.E. Sjostrand, Proc. 7th Intl. Conf. on CVD, Princeton, N.J., 1979; p. 452.
74. F. Leyssandien, C. Bernard and M. Ducanoir, J. Mater. Sci., 23, 135 (1988).
75. D.G. Bhat, Proc. 11th Intl. Conf. on CVD, K.E. Spear and G.W. Gullen (Eds.), Electrochem. Soc., Pennington, N.J., 1990; p. 618.
76. N. Nakanichi, S. Mori and F. Kato, J. Electrochem. Soc., 137, 122 (1990).
77. H. Itoh, K. Kato and K. Sugiyama, J. Mater. Sci., 21, 751 (1986).
78. M.H. Staia, B. Lewis, J. Cawlay and T. Hudson, Surf. Coat. Tech., 76-77, 231 (1995).
79. V.K. Sarin, Proc. 7th Intl. Conf. on CVD, Princeton, N.J., 1979; p. 476.
80. G. Verspui, Proc. 7th Intl. Conf. on CVD, Princeton, N.J., 1979; p. 463.
81. K.S. Mogensen, N.B. Thomsen, S.S. Eskildsen, C. Mathiasen and J. Bottiger, Surf. Coat. Tech., 99 (12), 140 (1998).
82. A. Caputo, W.J. Lackey, I.G. Wright and P. Angelini, J. Electrochem. Soc., 132 (9), 2274 (1985).
83. A. Caputo, W.J. Lackey and I.G. Wright, Proc. 9th Intl. Conf. on CVD, 1984; p. 872.
84. M.K. Hirschfeld, C. Pfohl, K.T. Rie and J.W. Schultze, Materialwiss. Werkstofftech., 29 (9), 484 (1998).
85. M. Heinze, Surf. Coat. Tech., 105 (1-2), 38 (1998).
86. P.J. Sherwood, C. Hayman and A. Bowny, Proc. 5th Intl. Conf. on CVD, 1975; p. 801.
87. G. Giunta, M. Fiorini, V. Vittori and G. Marchesano, Surf. Coat. Tech., 49, 174 (1991).
88. J.P.A.M. Driessen, A.D. Kupers and J. Schoonman, Proceedings of EUROMAT 97, 1997; p. 13.
89. H. Ahn, C. Pfohl, J. Whole, A. Gebauer, S. Bierner, A. Bulak, E. Menthe, E.R. Cabeo and T. Stucky, Materialwiss. Werkstofftech., 27 (1-2), 57 (1996).
90. S.J. Bull and A.M. Jones, Surf. Coat. Tech., 78 (1-3), 173 (1996).