Laser chemical vapor deposition of thin films

Materials Science and Engineering B

Volumn 41, Issue 3, 1996, Pages 368-373

  Kar, A ^a   Mazumder, J ^b  

^a University of Central Florida   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Damkohler number; Laser chemical vapor deposition; Thin films

Indexed keywords

CONDUCTIVE MATERIALS; CORROSION; LASER APPLICATIONS; MATHEMATICAL MODELS; MORPHOLOGY; OXIDATION; QUALITY ASSURANCE; THERMOANALYSIS; THIN FILMS; WEAR RESISTANCE;

DAMKOHLER NUMBER; LASER CHEMICAL VAPOR DEPOSITION; LASER PARAMETERS; OPTIMUM CONDITION; PROCESSING CONDITIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 0030393313     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01890-9     Document Type: Article

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