Chemical vapor deposition of Si3N4 onto metal substrates

Surface and Coatings Technology

Volumn 49, Issue 1-3, 1991, Pages 13-17

  Taniuchi, T ^a   Adachi, T ^a   Kobayashi, K ^a  

^a RIMES Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS-CERAMIC; SILICON NITRIDE; VAPOUR DEPOSITION;

METALS AND ALLOYS - PROTECTIVE COATINGS; SILICON NITRIDE - CHEMICAL VAPOR DEPOSITION;

OXIDATION RESISTANCE;

COATINGS;

EID: 0026373211     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(91)90024-Q     Document Type: Article

References (11)

1. Performance of titanium nitride diffusion barriers in aluminum–titanium metallization schemes for integrated circuits
2. TiB2 and ZrB2 diffusion barriers in GaAs Ohmic contact technology
3. Chemical Vapor Deposition of Titanium Nitride on Iron in an Ultrasonic Field