Preparation of SiC thin film using organosilicon by remote plasma CVD method

Materials Research Society Symposium - Proceedings

Volumn 544, Issue , 1999, Pages 185-189

  Xu, Ying Yu ^a   Muramatsu, Takahiro ^a   Aok, Toru ^a   Nakanishi, Yoichiro ^a   Hatanaka, Yoshinori ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ARGON; FILM PREPARATION; HYDROGEN; ION BOMBARDMENT; MIXTURES; MOLECULAR STRUCTURE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

HEXAMETHYLDISILANE; HYDROGENATED AMORPHOUS SILICON CARBIDE;

THIN FILMS;

EID: 0033322752     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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