Annealing behaviour of boron atoms implanted into polyethyleneterephthalate

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 637-640

  Vacik J ^a   Hnatowicz, V ^a   Cervena J ^a   Perina V ^a   Popok, V ^b   Odzhaev, V ^b   Svorcik V ^c   Rybka, V ^c   Arenholz, E ^d   Fink, D ^e  

^a NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

^c INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^d JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^e HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; BORON; ION IMPLANTATION; POSITIVE IONS;

NEUTRON DEPTH PROFILING TECHNIQUE (NDP);

POLYETHYLENE TEREPHTHALATES;

EID: 18144436805     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01049-6     Document Type: Article

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