High fluence boron implantation into polyimide

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 1126-1130

  Vacik J ^a   Hnatowicz, V ^a   Cervena J ^a   Perina V ^a   Popok, V ^b   Odzhaev, V ^b   Fink, D ^c  

^a NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

Annealing; Boron implantation; Depth profiles; Polyimide

Indexed keywords

ANNEALING; BORON; CARRIER MOBILITY; DESORPTION; ELECTRON TRAPS; POLYIMIDES;

HIGH FLUENCE BORON IMPLANTATIONS; SOFTWARE PACKAGE TRIM;

ION IMPLANTATION;

EID: 0033513659     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00814-3     Document Type: Article

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