How long can we succeed using the OBIRCH and its derivatives?

Proceedings - International Test Conference

Volumn , Issue , 2004, Pages 1443-

  Nikawa, Kiyoshi ^a  

^a RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATED TEST EQUIPMENT (ATE); OPTICAL BEAM INDUCED RESISTANCE CHANGE (OBIRCH); SCHOTTKY EFFECT; SEMICONDUCTOR INDUSTRY;

AUTOMATIC TESTING; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTROMAGNETIC WAVE ATTENUATION; HEATING; INTEGRATED CIRCUITS; LASER BEAMS; OPTICAL ENGINEERING; OPTICAL INSTRUMENT LENSES; OPTICAL VARIABLES MEASUREMENT; SEEBECK EFFECT; SEMICONDUCTOR DEVICE MANUFACTURE;

FAILURE ANALYSIS;

EID: 18144399688     PISSN: 10893539     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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