Influence of ion energies on the surface morphology of carbon films

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 241-245

  Li, Liu Hena ^a,b   Tian, J Z ^c   Cai, X ^a   Chen, Q L ^a   Xu, M ^a   Wu, Y Q ^b   Fu, Ricky K Y ^d   Chu, Paul K ^d  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b BEIHANG UNIVERSITY   (China)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Carbon films; Deposition; Plasma immersion ion implantation; Surface morphology; Vacuum arc deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; ION IMPLANTATION; MICROSTRUCTURE; MORPHOLOGY; NUCLEATION; RAMAN SPECTROSCOPY; SURFACES;

AROMATIC RING CLUSTERS; PLASMA IMMERSION ION IMPLANTATION (PIII); VACUUM ARC DEPOSITION (VAD);

AMORPHOUS FILMS;

COATING;

EID: 18144397247     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.223     Document Type: Article

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