Characteristics of plasma-enhanced atomic-layer deposited (PEALD) SnO 2 thin films

Journal of the Korean Physical Society

Volumn 46, Issue 4, 2005, Pages

  Lee, Woonyoung ^a   Choi, Yongkook ^a   Hong, Kwangjun ^b   Kim, Nam Hoon ^b   Park, Yongju ^b   Park, Jinseong ^b  

^a Chonnam National University   (South Korea)

^b Chosun University   (South Korea)

Author keywords

Plasma enhanced atomic layer deposition (PEALD); Thin film; Tin dioxide

Indexed keywords

EID: 17744377987     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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