Ion current extracted from a self ignition plasma around the target immersed in a pulsed rf ICP methane plasma

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 817-819

  Tanaka, Takeshi ^a   Watanabe, Satoshi ^a   Mizuno, Giichiro ^a   Takagi, Toshinori ^a   Yoshida, Mitsuhiro ^b   Horibe, Hiroshi ^c   Yukimura, Ken ^d  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^c Kurita Seisakusho Co Ltd   (Japan)

^d DOSHISHA UNIVERSITY   (Japan)

Author keywords

Ion current; Plasma based ion implantation; RF plasma

Indexed keywords

ELECTRIC POTENTIAL; IGNITION; ION IMPLANTATION; METHANE; TARGETS;

ION CURRENTS;

INDUCTIVELY COUPLED PLASMA;

EID: 0037736814     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00856-5     Document Type: Conference Paper

References (2)

1. Conrad J.R. J. Appl. Phys. 62:1987;777.
2. Tanaka T., Yoshida M., Shinohara M., Takagi T. J. Vac. Sci. Technol., A. 20:2002;625. [blank_line]