Elastic properties of hard TiCxNy films grown by dual ion beam sputtering

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 365-369

  Fuentes, G G ^a   Caceres D ^b   Vergara, I ^b   Elizalde, E ^a   Sanz, J M ^a  

^a INSTITUTO NICOLÁS CABRERA   (Spain)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

Dual ion beam sputtering system; Hardness; TiCxNy

Indexed keywords

ANNEALING; INDENTATION; ION BEAMS; ION BOMBARDMENT; SPUTTERING; TITANIUM CARBIDE;

LATTICE DEFECTS;

THIN FILMS;

ELASTIC PROPERTY; HARDNESS; SPUTTERING;

EID: 17544395645     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01558-4     Document Type: Article

References (14)