Bimorph-type microactuator using TiNi shape-memory thin film

Materials Science Forum

Volumn 394-395, Issue , 2002, Pages 487-490

  Ishida, A ^a   Sato, M ^a   Yoshikawa, W ^a   Tabata, O ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Microactuator; Shape Memory Thin Film; Sputtering Deposition; Thermal Stress; TiNi

Indexed keywords

HYSTERESIS; MICROACTUATORS; PHASE TRANSITIONS; SILICON; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EXPANSION; THERMAL STRESS; THIN FILMS; TITANIUM ALLOYS;

FREESTANDING FILMS;

SHAPE MEMORY EFFECT;

EID: 17544390864     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.394-395.487     Document Type: Conference Paper

References (5)

1. A. Ishida and S. Miyazaki: Trans. ASME, Vol. 121 (1999), p. 2.
2. J. Zhang and D.S. Grummon: Proc. Mater. Res. Soc. Vol. 459(1997), p. 451.
3. P. Krulevitch, A.P. Lee, P.B. Ramsy, J.C. Trevino, J. Hamilton and M.A. Northrup: J. Microelectromechanical Systems, Vol. 5 (1996), p. 270.
4. B. Winzek, E. Quandt, H. Holleck: Conf. Proc. of Actuator 2000, Vol. A.5.5(2000) p. 172.
5. A. Ishida, M. Sato, T. Kimura and T. Sawaguchi: Mater. Trans., JIM, Vol. 42(2001), p. 1060.