Characterization of surface chemical states of a thick insulator: Chemical state imaging on MgO surface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 2, 2005, Pages 861-864

  Yi, Yeonjin ^a   Cho, Sangwan ^a   Noh, Myungkeun ^a   Whang, Chung Nam ^a   Jeong, Kwangho ^a   Shin, Hyun Joon ^b  

^a Yonsei University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Chemisorptions; Insulator surface; Magnesium oxides; Scanning photoelectron microscopy; Surface chemical reaction; Surface chemical state

Indexed keywords

CHEMISORPTION; GLASS; IMAGING TECHNIQUES; MAGNESIA; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; PLASMA DISPLAY DEVICES; RADIATION DAMAGE; SPECTROSCOPIC ANALYSIS; SURFACE REACTIONS;

INSULATOR SURFACE; SCANNING PHOTOELECTRON MICROSCOPY; SURFACE CHEMICAL REACTION; SURFACE CHEMICAL STATE;

SURFACE CHEMISTRY;

EID: 17444428951     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.861     Document Type: Article

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