Structural and luminescence characteristics of post-annealed ZnO films on Si (111) in H2O ambient

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

  Lee, Ju Young ^a   Kim, Hong Seung ^a   Chang, Ji Ho ^a   Yang, Min ^a   Ahn, Hyong Su ^a   Ryu, Sang Ouk ^b  

^a Korea Maritime University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

H2O ambient; Luminescence; Post annealing; Structural; ZnO

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DIFFUSION; OPTICAL PROPERTIES; OXIDATION; PHOTOLUMINESCENCE; SILICA; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

H2O AMBIENT; POST-ANNEALING; STRUCTURAL PROPERTIES; WET OXIDATION;

ZINC OXIDE;

EID: 17444405339     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L205     Document Type: Article

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