EUV beam splitter for use in the wavelength region around 6 nm

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 1043-1045

  Takenaka, Hisataka ^a   Ichimaru, Satoshi ^a   Gullikson, E M ^b  

^a NTT Advance Technology Corporation   (Japan)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Beam splitter; EUV; Free standing; Multilayer

Indexed keywords

ETCHING; LIGHT REFLECTION; MAGNETRON SPUTTERING; MULTILAYERS; OPTIMIZATION; SILICON NITRIDE; ULTRAVIOLET RADIATION; X RAY LASERS;

BEAM SPLITTERS; EXTREME ULTRAVIOLET (EUV); FREE-STANDING; WAVELENGTHS;

OPTICAL BEAM SPLITTERS;

EID: 17444399351     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.293     Document Type: Conference Paper

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