Fabrication of soft X-ray beam splitters for use in the wavelength region around 13 nm

Journal De Physique. IV : JP

Volumn 104, Issue , 2003, Pages 251-254

  Takenaka, H ^a   Ichimaru, S ^a   Haga, T ^b   Ohchi, T ^a   Ito, H ^a   Muramatsu, Y ^c   Gullikson, E M ^d   Perera, R C C ^d  

^a NTT Advance Technology Corporation   (Japan)

^b NTT CORPORATION   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; LASER PRODUCED PLASMAS; LITHOGRAPHY; MICROSCOPIC EXAMINATION; OPTICAL MULTILAYERS; REFLECTION; ULTRAVIOLET RADIATION; X RAYS;

GRAZING INCIDENCE; INCIDENT ANGLE; MULTILAYER BEAM SPLITTER; NORMAL INCIDENCE; X RAY BEAM SPLITTERS;

OPTICAL BEAM SPLITTERS;

EID: 0037687948     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:200300073     Document Type: Conference Paper

References (9)

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