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Volumn 2873, Issue , 1996, Pages 105-108

Super-flat high-reflectivity semi-transparent polarizer for soft x-ray

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; MULTILAYER FILMS; MULTILAYERS; POLARIMETERS; POLARIZATION; PRISMS; REFLECTION; SURFACE ROUGHNESS; SYNCHROTRON RADIATION;

EID: 0037588648     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.246192     Document Type: Conference Paper
Times cited : (6)

References (12)
  • 2
    • 0005186684 scopus 로고
    • Revolution in x-ray optics
    • N. M. Ceglio, "Revolution in x-ray optics", J. X-ray Sci. Technol., 1, 7-78 (1989).
    • (1989) J. X-ray Sci. Technol. , vol.1 , pp. 7-78
    • Ceglio, N.M.1
  • 3
    • 0010473501 scopus 로고
    • Full polarization measurement of synchrotron radiation with use of soft x-ray multilayers
    • H. Kimura, M. Yamamoto, M. Yanagihara, T. Maehara, and T. Namioka, "Full polarization measurement of synchrotron radiation with use of soft x-ray multilayers, " Rev. Sci. Instrum. 63, 1379-1382 (1992).
    • (1992) Rev. Sci. Instrum. , vol.63 , pp. 1379-1382
    • Kimura, H.1    Yamamoto, M.2    Yanagihara, M.3    Maehara, T.4    Namioka, T.5
  • 7
    • 0343240393 scopus 로고
    • Applications of microfabrication technology to X-ray laser cavities
    • A. M. Hawryluk, N. M. Ceglio, and D. G. Stearns, "Applications of microfabrication technology to X-ray laser cavities, " J Vac. Sci. Technol. B6(6), 2153-2157 (1988).
    • (1988) J Vac. Sci. Technol. , vol.B6 , Issue.6 , pp. 2153-2157
    • Hawryluk, A.M.1    Ceglio, N.M.2    Stearns, D.G.3
  • 9
    • 85075721537 scopus 로고
    • Design, fabrication, and polarization of soft-x-ray transmission multilayers
    • H. Nomura, K. Mayama, T. Sakai, M. Yamamoto, and M. Yanagihara, "Design, fabrication, and polarization of soft-x-ray transmission multilayers, " Proc. SPIE, 1720 395-401 (1992).
    • (1992) Proc. SPIE , vol.1720 , pp. 395-401
    • Nomura, H.1    Mayama, K.2    Sakai, T.3    Yamamoto, M.4    Yanagihara, M.5
  • 10
    • 0002674891 scopus 로고
    • Achievement of low stress Mo/Si mirrors
    • Frits Zernike and David Attwood, eds. Optical Society of America, Washington, DC
    • T. D. Nguyen, C. K. Malek, and J. H. Underwood, "Achievement of Low Stress Mo/Si Mirrors, " OSAProceedings on Extreme Ultraviolet Lithography, Frits Zernike and David Attwood, eds. (Optical Society of America, Washington, DC 1995) Vol. 23, pp. 56-60.
    • (1995) OSAProceedings on Extreme Ultraviolet Lithography , vol.23 , pp. 56-60
    • Nguyen, T.D.1    Malek, C.K.2    Underwood, J.H.3
  • 11
    • 85075925836 scopus 로고    scopus 로고
    • Multilayer sputter deposition stress control
    • J. Electron Spectrosc. Related Phenomena
    • M. C. K. Tinone, T. Haga, and H. Kinoshita, "Multilayer sputter deposition stress control, " Proc. of VUV-XI '95 to be published at J. Electron Spectrosc. Related Phenomena.
    • Proc. Of VUV-XI '95
    • Tinone, M.C.K.1    Haga, T.2    Kinoshita, H.3
  • 12
    • 21844506526 scopus 로고
    • Application of electron cyclotron resonance plasma source to conducyive film deposition
    • M. Shimada, T. Ono, H. Nishimura, and S. Matsuo, "Application of electron cyclotron resonance plasma source to conducyive film deposition, " J. Vac. Sci. Technol. A13(3), 815-819 (1995).
    • (1995) J. Vac. Sci. Technol. , vol.A13 , Issue.3 , pp. 815-819
    • Shimada, M.1    Ono, T.2    Nishimura, H.3    Matsuo, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.