Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurements

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 443-449

  Pribil, G K ^a   Johs, B ^a   Ianno, N J ^b  

^a J A WOOLLAM CO INC   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

In situ; Metal dielectric function; Spectroscopic ellipsometry; Transmission

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; ELLIPSOMETRY; FUSED SILICA; METALLIC FILMS; NUCLEATION; SPECTROSCOPIC ANALYSIS; SYNTHESIS (CHEMICAL);

FILM DEPOSITION; METAL DIELECTRIC FUNCTION; ROTATING COMPENSATOR ELLIPSOMETER (RCE); SPECTROSCOPIC ELLIPSOMETRY;

THIN FILMS;

EID: 17144471065     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.243     Document Type: Conference Paper

References (14)

1. McGahan W.A., Johs B., Woollam J.A. Thin Solid Films. 234:1993;443.
2. An I., Nguyen H.V., Heyd A.R., Collins R.W. Rev. Sci. Instrum. 65:1994;3489.
3. Arwin H., Aspnes D.E. Thin Solid Films. 113:1984;101.
4. Nguyen H.V., An I., Collins R.W. Phys. Rev. Lett. 68:1992;994.
5. Nguyen H.V., An I., Collins R.W. Phys. Rev. B. 47:1993;3947.
6. M2000XI, J.A. Woollam Co., Inc., Lincoln, NE.
7. Johs B., Hale J., Ianno N.J., Herzinger C.M., Tiwald T., Woollam J.A. Proc. SPIE. 4449:2001;41.
8. Kleim R., Kuntzler L., El Ghemmaz A. J. Opt. Soc. Am. A. 11:1994;2550.
9. B. Johs, C. Herzinger, US Patent No. 6 034 777, 7 March 2000.
10. Rovira P.I., Collins R.W. J. Appl. Phys. 85:1999;2015.
11. Joerger R., Forcht K., Gombert A., Köhl M., Graf W. Appl. Opt. 36:1997;319.
12. Yang Y.H., Abelson J.R. J. Vac. Sci. Technol. A. 13:1995;1145.
13. Jellison G.E. Jr. Thin Solid Films. 234:1993;416.
14. Zettler J.-Th., Trepk Th., Spanos L., Hu Y.-Z., Richter W. Thin Solid Films. 234:1993;402.