Determination of optical properties of amorphous and crystalline thin films by spectroellipsometry

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 493-498

  Yamaguchi, Tomuo ^a   Jayatissa, Ahalapitiya Hewage ^a   Aoyama, Mitsuru ^a   Tabe, Michiharu ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Amorphous; Dielectric function; SIMOX; Spectroellipsometry

Indexed keywords

AMORPHOUS FILMS; CRYSTALLINE MATERIALS; DIELECTRIC PROPERTIES; ELLIPSOMETRY; FUNCTIONS; OPTICAL PROPERTIES; SILICA; SILICON WAFERS;

DIELECTRIC FUNCTION; SIMOX WAFERS; SPECTROELLIPSOMETRY;

THIN FILMS;

EID: 17144462474     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00891-4     Document Type: Article

References (14)

1. D.E. Aspnes and A.A. Studna, Phys. Rev. B 27 (1983) 985.
2. A.H. Jayatissa, M. Suzuki, Y. Nakanishi and Y. Hatanaka, Thin Solid Films 256 (1995) 234.
3. R.W. Collins, H. Windischman, J.M. Cavese and J.G. Hernandez, J. Appl. Phys. 58 (1985) 954.
4. D.E. Aspnes, A.A. Studna and E. Kinsbron, Phys. Rev. B 29 (1984) 764.
5. S. Adachi, Phys. Rev. B 38 (1988) 12966.
6. T. Suzuki and S. Adachi, Jpn. J. Appl. Phys. 32 (1993) 4900.
7. T. Yamaguchi, Y. Kaneko, A.H. Jayatissa, M. Aoyama, A.V. Zotov and V.G. Lifshits, J. Appl. Phys. 77 (1995) 4673.
8. T. Yamaguchi, Y. Kaneko, A.H. Jayatissa and M. Aoyama, Thin Solid Films 281-282 (1996) 302.
9. A.R. Forouhi and I. Bloomer, Phys. Rev. B 34 (1986) 7018.
10. H.R. Philipp, J. Electrochem. Soc. 120 (1973) 295.
11. K. Kajiyama, Appl. Surf. Sci. 85 (1995) 259.
12. Y. Takahashi, T. Ishiyama and M. Tabe, Appl. Phys. Lett. 65 (1994) 2987.
13. K. Kajiyama, Y. Morikawa, I. Hamaguchi and T. Yano, Jpn. J. Appl. Phys. 35 (1996) 526.
14. S. Nakashima and K. Izumi, J. Mater. Res. 8 (1993) 523.