Real-time studies of amorphous and microcrystalline Si:H growth by spectroscopic ellipsometry and infrared spectroscopy

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 670-674

  Fujiwara, Hiroyuki ^a   Kondo, Michio ^a   Matsuda, Akihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Grain growth; Infrared spectroscopy; Microcrystalline silicon; Real time spectroscopic ellipsometry

Indexed keywords

COALESCENCE; CRYSTALLINE MATERIALS; ELLIPSOMETRY; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; INFRARED SPECTROSCOPY; REAL TIME SYSTEMS; SILICON; THIN FILMS;

ATTENUATED TOTAL REFLECTION SPECTROSCOPY; MICROCRYSTALLINE SILICON; REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE;

AMORPHOUS FILMS;

EID: 17144447545     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.233     Document Type: Conference Paper

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