Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometer

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 705-709

  Tsuru, T ^a   Tsutou, T ^a   Yamamoto, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Automatic null ellipsometer; EUV multilayer; Layer by layer analysis; Picometer sensitivity

Indexed keywords

CYCLOTRON RESONANCE; DATA REDUCTION; ELLIPSOMETRY; ION BEAMS; LIGHT REFLECTION; MULTILAYERS; REAL TIME SYSTEMS; SENSITIVITY ANALYSIS; ULTRAVIOLET RADIATION;

AUTOMATIC NULL ELLIPSOMETERS; EUV MULTILAYERS; LAYER BY LAYER ANALYSIS; PICOMETER SENSITIVITY;

THIN FILMS;

EID: 17144435936     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.012     Document Type: Conference Paper

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