HREELS, TPD and ESD study of electron-induced decomposition of trimethylamine on Si(100) at 100 K

Surface and Interface Analysis

Volumn 37, Issue 4, 2005, Pages 366-373

  Lozano, J ^a   Early, D ^a   Craig Jr , J H ^a   Wang, P W ^a   Kimberlin, K R ^a  

^a BRADLEY UNIVERSITY   (United States)

Author keywords

Electron irradiation; ESD; HREELS; Si(100); Trimethylamine

Indexed keywords

ADSORPTION; CHEMISORPTION; DECOMPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON IRRADIATION; HIGH RESOLUTION ELECTRON MICROSCOPY; LOW TEMPERATURE EFFECTS; MONOLAYERS; SILICON; SURFACE CHEMISTRY; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ESD; HREELS; SI(100); TRIMETHYLAMINE;

AMINES;

EID: 17044424638     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1990     Document Type: Conference Paper

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