Effects of sample thickness on the van der Pauw technique for resistivity measurements

Review of Scientific Instruments

Volumn 76, Issue 3, 2005, Pages

  Kasl, C ^a   Hoch, M J R ^a  

^a UNIVERSITY OF THE WITWATERSRAND   (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

RESISTANCE LADDER; SEMICONDUCTOR WAFERS; SURFACE-DIAMETER RATIO; VAN DER PAUW TECHNIQUE;

APPROXIMATION THEORY; CURRENT DENSITY; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTRODES; SINTERING;

ELECTRIC VARIABLES MEASUREMENT;

EID: 17044413581     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1866232     Document Type: Article

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