Asymmetric properties of the aerial image in EUVL

Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000

Volumn , Issue , 2000, Pages 46-47

  Otaki, K ^a   Oizumi, H ^a   Ito, M ^a   Nishiyama, I ^a   Okazaki, S ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; MASKS; NANOTECHNOLOGY;

DIFFRACTION WAVES; ILLUMINATION ANGLE; ILLUMINATION SYSTEM; OBLIQUE ANGLES; OBLIQUE ILLUMINATION; PROJECTION OPTICS; REFLECTIVE TYPE; VECTOR DIFFRACTION THEORY;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 1642576726     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2000.872615     Document Type: Conference Paper

References (4)

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2. B. S. Bollepali et al., J. Vac. Sci. Technol. B17, 2992 (1999)
3. P. Lalanne et al., J. Opt. Soc. Am. A13, 779 (1996)
4. D. G. Flagello et al., J. Opt. Soc. Am. A13, 53 (1996)