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Volumn 95-96, Issue , 2004, Pages 447-452

Microstructural and Electrical Properties of NiSi2 Precipitates at Dislocations in Silicon

Author keywords

Deep Level Transient Spectroscopy (DLTS); Dislocations; Metallic Impurities; Silicon; Suicide Precipitates; Transmission Electron Microscopy

Indexed keywords

BAND STRUCTURE; CRYSTAL GROWTH; CRYSTAL IMPURITIES; CRYSTAL MICROSTRUCTURE; DEEP LEVEL TRANSIENT SPECTROSCOPY; DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; NICKEL COMPOUNDS; NUCLEATION; OXIDATION; PLASTIC DEFORMATION; PRECIPITATION (CHEMICAL); SILICON; TRANSMISSION ELECTRON MICROSCOPY;

EID: 1642560894     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (11)
  • 6
    • 0011470173 scopus 로고    scopus 로고
    • K.A.Jackson and W.Schröter (eds.) (VCH Wiley, Weinheim, New York)
    • W.Schröter, M.Seibt, and D.Gilles, in: Handbook of Semiconductors Vol.1, K.A.Jackson and W.Schröter (eds.) (VCH Wiley, Weinheim, New York 2000), p.597
    • (2000) Handbook of Semiconductors , vol.1 , pp. 597
    • Schröter, W.1    Seibt, M.2    Gilles, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.