Effect of Chamber Seasoning on the Chrome Dry Etch Process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 92-100

  Clevenger, Jason O ^a   Buie, Melisa J ^a   Sandlin, Nicole ^a  

^a Etec Systems Inc   (United States)

Author keywords

Chamber condition; Chrome etch; Process performance; Seasoning

Indexed keywords

ALGORITHMS; CHARGE COUPLED DEVICES; CHROMIUM; MASKS; MONOCHROMATORS; MONOLAYERS; PLASMA ETCHING; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE PROPERTIES; WSI CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINA COUPON SURFACE ANALYSIS; CHAMBER CONDITION; CHAMBER SEASONING; CRITICAL DIMENSIONS (CD); PROCESS PERFORMANCE;

DRY ETCHING;

EID: 1642555765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504053     Document Type: Conference Paper

References (6)

1. S. Xu, Z. Sun, X Qian, J. Holland, and D. Podlesnik, "Characteristics and Mechanism of Etch Process Sensitivity to Chamber Surface Condition," J. Vac. Sci. Technol. B, Vol. 19, No.1, pp. 166-171, Jan/Feb 2001.
2. S. Xu, T. Lill, S. Deshmukh, and O. Joubert, "Effect of surface polymerization on plama and process stability in polysilicon etching," J. Vac. Sci. Technol. A, Vol. 20, No. 6, pp. 2123-2130, Nov/Dec 2002.
3. M.Buie, B. Stoehr, A. Buxbaum, and G. Ruhl, "An Endpoint Solution for Photomask Chrome Loads Down to 0.25%," SPIE Proc., Vol. 4562, pp. 616-623, 2002.
4. R. Anderson, N. Sandlin, M. Buie, C. Su, A. Agarwal, C. Brooks, Y.C. Huang, and B. Stoehr, "In-situ optical emission spectroscopic examination of chrome etch for photomasks," SPIE Proc., Vol 4754, pp. 313-322, 2002.
5. 2 and He in the chrome etch process with optical emission spectroscopy," SPIE Proc. Vol. 4889, p. 641, 2002.
6. Charles Evans and Associates, Inc., private communication.