Study of the role of Cl2, O2, and He in the chrome etch process with optical emission spectroscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 641-652

  Anderson, Rex ^a   Ruhl, Guenther ^b   Sandlin, Nicole ^a   Buie, Melisa ^a  

^a Etec Systems Inc   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Applied Materials; Chrome etch; Cr; Endpoint detection; Etec; OES; Optical emission spectroscopy; Plasma diagnostics; Tetra

Indexed keywords

ETCHING; LIGHT EMISSION; PROCESS CONTROL; SPECTROSCOPIC ANALYSIS;

PHOTOMASKS;

PLASMA DIAGNOSTICS;

EID: 0038303169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467849     Document Type: Conference Paper

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