Advanced Lateral Crystal Growth of a-Si Thin Films by Double-Pulsed Irradiation of All Solid-State Lasers

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 687-692

  Kudo, Toshio ^a   Seike, Koji ^a   Yamazaki, Kazunori ^a   Komori, Hirohito ^a   Yawaka, Sachi ^a   Hamada, Shiro ^a   Jin, Cheng Guo ^b  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b TIC Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; CRYSTALLIZATION; EXCIMER LASERS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LASER BEAM EFFECTS; LEAKAGE CURRENTS; MELTING; SILICON; SOLID STATE LASERS; SOLIDIFICATION; SURFACE ROUGHNESS;

ADVANCED LATERAL CRYSTAL GROWTH (ALCG); LASER SHOTS;

THIN FILMS;

EID: 1642541170     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a16.5     Document Type: Conference Paper

References (10)

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4. A. Hara and N. Sasaki, IEDM. Tech. Digest 943, 301(1999).
5. Y. Helen et al, Thin Solid Films 383, 143 (2001).
6. M. Hatano, T. Shiba and M. Ohkura, SID. Digest (2002) p. 158.
7. K. Yamazaki et al, AM-LCD2002 Digest (2002) p.149.
8. T. Kudo, D. Ichishima and C-G. Jin, AM-LCD2000 Digest (2000) p. 125.
9. T. Kudo (private communication)
10. T. Fujimura et al, AM-LCD2001 Digest (2001) p. 175.