Improvement of Chrome CDU by Optimizing Focus Ring Design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 264-274

  Anderson, Rex ^a   Ruhl, Guenther ^b   Nesladek, Pavel ^b   Prechtl, Gerhard ^b   Sabisch, Winfried ^b   Kersch, Alfred ^b   Buie, Melisa J ^a  

^a Etec Systems Inc   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Chrome etch; Dry etch; Focus ring; Plasma

Indexed keywords

CHROME CRITICAL DIMENSION (CD) UNIFORMITY; CHROME ETCH; DRY ETCH; FOCUS RING; UNIFORM RADICAL DISTRIBUTION;

COMPUTER SIMULATION; HARDWARE; OPTIMIZATION; PLASMA ETCHING; PRODUCT DESIGN; RINGS (COMPONENTS); SCANNING ELECTRON MICROSCOPY;

MASKS;

EID: 1642514800     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504199     Document Type: Conference Paper

References (8)

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