New approaches to alternating phase shift mask inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 138-144

  Zurbrick, Larry ^a   Heumann, Jan ^b   Rudzinski, Maciej ^a   Stokowski, Stan ^a   Urbach, Jan Peter ^b   Wang, Lantian ^a  

^a KLA TENCOR CORPORATION   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Alternating phase shift masks; Inspection

Indexed keywords

ALGORITHMS; DEFECTS; ETCHING; LIGHT REFLECTION; LITHOGRAPHY; PHASE SHIFT;

PHASE SHIFT MASKS;

MASKS;

EID: 0035766402     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458285     Document Type: Article

References (3)

1. th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, VDE/VDI-Society Microelectronics, Uwe Behringer - Chairperson (2000).
2. C. Hung, et al., "Multibeam high-resolution UV wavelength reticle inspection", Proc. SPIE Vol. 4409, p.520-531, Photomask and Next Generation Lithography Mask Technology VIII, Hiroichi Kawahira; Ed. (2001).
3. th Annual Symposium on Photomask Technology, Frank E. Abboud; Brian J. Grenon; Eds. (1999).