Defect printability of alternative phase-shift mask: A critical comparison of simulation and experiment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1009-1020

  Ozawa, Ken ^a   Komizo, Tohru ^a   Kikuchi, Koji ^a   Ohnuma, Hidetoshi ^a   Kawahira, Hiroich ^a  

^a SONY CORPORATION   (Japan)

Author keywords

3 dimensional FDTD simulation; Alternative phase shift mask; Phase defect printability

Indexed keywords

ARGON; COMPUTER SIMULATION; CRYSTAL DEFECTS; KRYPTON; MASKS; PHOTOLITHOGRAPHY; QUARTZ;

DEFECT PRINTABILITY;

PHASE SHIFT;

EID: 0036411468     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474479     Document Type: Article

References (7)

1. M.D. Levenson, N.S. Viswanathan, R. Simpson, 'Improving resolution in photolithography with a phase shifting mask', IEEE Trans. Electron Device, ED-29, p1828 (1982).
2. I. Kagami, D. Kakuta, T. Komizo, H. Kawahira, 'Focused ion beam repair for Qz bump defect of alternating phase-shift masks', Proc. SPIE, vol. 4409, p563, 2001.
3. T. Komizo, I. Kagami, D. Kakuta, H. Kawahira, 'Optimization of fabrication process for dual-trench-type alternating PSM', Proc. SPIE, vol. 4409, p125, 2001.
4. K. Kikuchi, H. Ohumna, H. Kawahira, 'New Optimization Method of the Exposure with Alternative Phase Shifting Mask', Proc. SPIE, vol.4409, p41, 2001.
5. T. Pistor, 'Rigorous 3D Simulation of Phase Defects in Alternating Phase Shifting Masks', 21st Annual BACUS Symposium on Photo-mask Technology, to appear.
6. Y. Morikawa, H. Kokubo, M. Nara, H. Miyashita, N. Hayashi '100 nm-Alt. PSM structure discussion for ArF lithography', Proc. SPIE, vol.4409, p132, 2001.
7. T. Yamamoto, N. Ishiwata, Y. Yanagishita, T. Kobayashi, S. Asai, 'Optimization of Alternating Phase Shift Mask Structure for ArF Laser Lithography', Proc. SPIE, vol.4409, p52, 2001.