Metastable iron silicide phase formation by pulsed laser annealing

Journal of Applied Physics

Volumn 95, Issue 5, 2004, Pages 2365-2370

  Comrie, C M ^a   Falepin, A ^b   Richard, O ^c   Bender, H ^c   Vantomme, A ^b  

^a UNIVERSITY OF CAPE TOWN   (South Africa)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; DIFFUSION; EXCIMER LASERS; FILM GROWTH; HEATING; LASER PULSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPECTROMETRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

PHASE FORMATION; PULSED LASER ANNEALING;

IRON COMPOUNDS;

EID: 1642368200     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1644900     Document Type: Article

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