-
3
-
-
0003238035
-
-
Liu H C, Li L, Baribeau J-M, Buchanan M and Simmons J G 1992 J. Appl. Phys. 71 2039
-
(1992)
J. Appl. Phys.
, vol.71
, pp. 2039
-
-
Liu, H.C.1
Li, L.2
Baribeau, J.-M.3
Buchanan, M.4
Simmons, J.G.5
-
5
-
-
0032139413
-
-
Wang R, Chen P, Tsien P, Luo G, Zhou J and Liu A 1998 Inf. Phys. Tech. 39 293
-
(1998)
Inf. Phys. Tech.
, vol.39
, pp. 293
-
-
Wang, R.1
Chen, P.2
Tsien, P.3
Luo, G.4
Zhou, J.5
Liu, A.6
-
6
-
-
0343976493
-
-
Wada H, Nagashima M, Hayashi K, Nakanishi J, Kimata M, Kumada N and Ito S 1999 Proc. SPIE 3698 72
-
(1999)
Proc. SPIE
, vol.3698
, pp. 72
-
-
Wada, H.1
Nagashima, M.2
Hayashi, K.3
Nakanishi, J.4
Kimata, M.5
Kumada, N.6
Ito, S.7
-
7
-
-
0034294406
-
-
Presting H, Konle J, Hepp M, Kibbel H, Thonke K, Sauer R, Corbin E and Jaros M 2000 Opt. Eng. 39 2624
-
(2000)
Opt. Eng.
, vol.39
, pp. 2624
-
-
Presting, H.1
Konle, J.2
Hepp, M.3
Kibbel, H.4
Thonke, K.5
Sauer, R.6
Corbin, E.7
Jaros, M.8
-
10
-
-
0031165777
-
-
Masini G, Colace L, Galluzzi F, Assanto G, Pearsall T P and Presting H 1997 Appl. Phys. Lett. 70 3194
-
(1997)
Appl. Phys. Lett.
, vol.70
, pp. 3194
-
-
Masini, G.1
Colace, L.2
Galluzzi, F.3
Assanto, G.4
Pearsall, T.P.5
Presting, H.6
-
14
-
-
0026152335
-
-
Tohyama S, Teranishi N, Konuma K, Nishimura M, Arai K and Oda E 1991 IEEE Trans. Electron Devices 38 1136
-
(1991)
IEEE Trans. Electron Devices
, vol.38
, pp. 1136
-
-
Tohyama, S.1
Teranishi, N.2
Konuma, K.3
Nishimura, M.4
Arai, K.5
Oda, E.6
-
17
-
-
0001502529
-
-
Lafontaine H, Houghton D C, Elliot D, Rowell N L, Baribeau J-M, Laframboise S, Sproule G I and Rolfe S J 1996 Vac. Sci. Technol. B 14 1675
-
(1996)
Vac. Sci. Technol. B
, vol.14
, pp. 1675
-
-
Lafontaine, H.1
Houghton, D.C.2
Elliot, D.3
Rowell, N.L.4
Baribeau, J.-M.5
Laframboise, S.6
Sproule, G.I.7
Rolfe, S.J.8
-
18
-
-
0026153740
-
-
Lin T L, Ksendzov A, Dejewski S M, Jones E W, Fathauer R W, Krabach T N and Maserjian J 1991 IEEE Trans. Electron Devices 38 1141
-
(1991)
IEEE Trans. Electron Devices
, vol.38
, pp. 1141
-
-
Lin, T.L.1
Ksendzov, A.2
Dejewski, S.M.3
Jones, E.W.4
Fathauer, R.W.5
Krabach, T.N.6
Maserjian, J.7
-
20
-
-
1642268274
-
-
Banisch R, Tillack B, Pressel K, Barth R and Erzgräber H 1997 Thin Solid Films 294 254
-
(1997)
Thin Solid Films
, vol.294
, pp. 254
-
-
Banisch, R.1
Tillack, B.2
Pressel, K.3
Barth, R.4
Erzgräber, H.5
-
21
-
-
0005306591
-
-
Park J S, Lin T L, Jones E W, Del Castillo H M and Gunapala S D 1994 Appl. Phys. Lett. 64 2370
-
(1994)
Appl. Phys. Lett.
, vol.64
, pp. 2370
-
-
Park, J.S.1
Lin, T.L.2
Jones, E.W.3
Del Castillo, H.M.4
Gunapala, S.D.5
-
24
-
-
0024610596
-
-
Raynolds D B, Seib D H, Stetson S B, Herter T, Rowlands N and Schoenwald J IEEE Trans. Nucl. Sci. 1989 36 857
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, pp. 857
-
-
Raynolds, D.B.1
Seib, D.H.2
Stetson, S.B.3
Herter, T.4
Rowlands, N.5
Schoenwald, J.6
-
25
-
-
0000168471
-
-
Huffmann J E, Crouse A G, Halleck B L, Downes T V and Herter T L 1992 J. Appl. Phys. 72 273
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 273
-
-
Huffmann, J.E.1
Crouse, A.G.2
Halleck, B.L.3
Downes, T.V.4
Herter, T.L.5
-
26
-
-
0036536866
-
-
Rylkov V V, Leotin J, Asadauskas L, Aronzon B A and Yu Kovalev D 2002 J. Appl. Phys. 91 4511
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 4511
-
-
Rylkov, V.V.1
Leotin, J.2
Asadauskas, L.3
Aronzon, B.A.4
Yu Kovalev, D.5
-
27
-
-
1642364099
-
-
at press
-
Aslan B, Turan R, Liu H C, Buchanan M, Baribeau J-M and Chow-Chong P Appl. Phys. B at press
-
Appl. Phys. B
-
-
Aslan, B.1
Turan, R.2
Liu, H.C.3
Buchanan, M.4
Baribeau, J.-M.5
Chow-Chong, P.6
-
28
-
-
0027547788
-
-
Liu H C, Li J, Buchanan M, Baribeau J-M and Simmons J G 1993 Electron. Lett. 29 407
-
(1993)
Electron. Lett.
, vol.29
, pp. 407
-
-
Liu, H.C.1
Li, J.2
Buchanan, M.3
Baribeau, J.-M.4
Simmons, J.G.5
|