Carrier illumination for characterization of ultrashallow doping profiles

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 439-443

  Clarysse, T ^a   Lindsay, R ^a   Vandervorst, W ^a,b   Budiarto, E ^c   Borden, P ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c Boxer Cross Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; INTERFACES (MATERIALS); LASER BEAMS; LIGHT PROPAGATION; LIGHT REFLECTION; LIGHT TRANSMISSION; NONDESTRUCTIVE EXAMINATION; OPTICAL SYSTEMS; RAPID THERMAL ANNEALING; REFRACTIVE INDEX; SEMICONDUCTOR DOPING;

CARRIER ILLUMINATION (CI); SURFACE RECOMBINATION;

SEMICONDUCTOR JUNCTIONS;

EID: 1642283555     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1617279     Document Type: Conference Paper

References (8)

1. International Technology Roadmap for Semiconductors, 2001.
2. P. Borden, L. Bechtler, K. Lingel, and R. Nijmeijer, in Handbook of Silicon Semiconductor Metrology, edited by A. C. Diebold (Dekker, New York, 2001), p. 97.
3. D. C. Sing and P. Borden, Proceedings of the Sixth International Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, edited by M. Foad (American Vacuum Society, New York, 2001), p. 311.
4. G. J. Kluth, W. G. En, P. Borden, L. Bechtler, and R. Nijmeijer, J. Vac. Sci. Technol. B 20, 640 (2002).
5. T. Clarysse, W. Vandervorst, R. Lindsay, P. Borden, E. Budiarto, J. Madsen, and R. Nijmeijer, Mater. Res. Soc. Proc. Vol. 717, edited by D. F. Downey, M. E. Law, A. Claverie, and M. J. Rendon, p. 285.
6. T. Clarysse, P. Eyben, T. Hantschel, and W. Vandervorst, Mater. Sci. Semicond. Process. 4, 61 (2001).
7. D. K. Schroder, Semiconductor Material and Device Characterization, 2nd ed. (Wiley, New York, 1998).
8. W. Vandervorst, T. Clarysse, N. Duhayon, P. Eyben, T. Hantschel, M. Xu, T. Janssens, H. De Witte, T. Conard, J. Deleu, and G. Badenes, IEDM Tech. Dig. 429 (2000).