A METAL and VIA maskset programmable VLSI design methodology using PLAs

IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD

Volumn , Issue , 2004, Pages 590-594

  Jayakumar, Nikhil ^a   Khatri, Sunil P ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY MASKS; METAL LAYERS; SEQUENTIAL DESIGNS; VLSI DESIGN;

ARRAYS; ELECTRIC NETWORK ANALYSIS; EMBEDDED SYSTEMS; LITHOGRAPHY; MICROPROCESSOR CHIPS; SEQUENTIAL CIRCUITS; VLSI CIRCUITS;

MASKS;

EID: 16244413620     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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