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Volumn , Issue , 2004, Pages 55-57

Influence of a tunneling gate current on the noise performance of SOI MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CONDUCTANCE; ELECTRIC CURRENTS; LEAKAGE CURRENTS; MATHEMATICAL MODELS; MICROWAVES; NATURAL FREQUENCIES; SILICON ON INSULATOR TECHNOLOGY; SPURIOUS SIGNAL NOISE;

EID: 16244410098     PISSN: 1078621X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (17)

References (9)
  • 1
    • 0029306263 scopus 로고
    • Influence of the gate leakage current on the noise performance of MESFETs and MODFETs
    • May
    • F. Danneville, G. Dambrine, H. Happy, P. Tadyszak and A. Cappy, "Influence of the gate leakage current on the noise performance of MESFETs and MODFETs", Solid-State Electronics, vol. 38, no. 5, pp. 1081-1087, May 1995.
    • (1995) Solid-state Electronics , vol.38 , Issue.5 , pp. 1081-1087
    • Danneville, F.1    Dambrine, G.2    Happy, H.3    Tadyszak, P.4    Cappy, A.5
  • 2
    • 0442296355 scopus 로고    scopus 로고
    • Comparative analysis of the RF and noise performance of bulk and single-gate ultra-thin SOI MOSFETs by numerical simulation
    • April
    • S. Eminente, M. Alessandrini and C. Fiegna, "Comparative analysis of the RF and noise performance of bulk and single-gate ultra-thin SOI MOSFETs by numerical simulation", Solid-State Electronics, vol. 48, no. 4, pp. 543-549, April 2004.
    • (2004) Solid-state Electronics , vol.48 , Issue.4 , pp. 543-549
    • Eminente, S.1    Alessandrini, M.2    Fiegna, C.3
  • 5
    • 0028430427 scopus 로고
    • 2 breakdown model for very low voltage lifetime extrapolation
    • May
    • 2 Breakdown Model for Very Low Voltage Lifetime Extrapolation", IEEE Trans. On Electron Devices, vol. 41, no. 5, pp. 761-767, May 1994.
    • (1994) IEEE Trans. on Electron Devices , vol.41 , Issue.5 , pp. 761-767
    • Schuegraf, K.F.1    Hu, C.2
  • 6
    • 0037818411 scopus 로고    scopus 로고
    • MOSFET gate leakage modeling and selection guide for alternative gate dielectrics based on leakage considerations
    • April
    • Y.-C. Yeo, T.-J. King and C. Hu, "MOSFET Gate Leakage Modeling and Selection Guide for Alternative Gate Dielectrics Based on Leakage Considerations", IEEE Trans. On Electron Devices, vol. 50, no. 4, pp. 1027-1035, April 2003.
    • (2003) IEEE Trans. on Electron Devices , vol.50 , Issue.4 , pp. 1027-1035
    • Yeo, Y.-C.1    King, T.-J.2    Hu, C.3
  • 7
    • 0035395857 scopus 로고    scopus 로고
    • Modeling CMOS tunneling currents through ultrathin gate oxide due to conduction- and valence-band electron and hole tunneling
    • July
    • W.-H. Lee and C. Hu, "Modeling CMOS Tunneling Currents Through Ultrathin Gate Oxide Due to Conduction- and Valence-band Electron and Hole Tunneling", IEEE Trans. On Electron Devices, vol. 48, no. 7, pp. 1366-1373, July 2001.
    • (2001) IEEE Trans. on Electron Devices , vol.48 , Issue.7 , pp. 1366-1373
    • Lee, W.-H.1    Hu, C.2
  • 8
    • 0014603115 scopus 로고
    • Nise in junction- and MOS-FETs at high temperatures
    • November
    • A. Van Der Ziel, "Noise in Junction- and MOS-FETs at high temperatures", Solid-State Electronics, vol. 12, n° 11, pp. 861-866, November 1969.
    • (1969) Solid-state Electronics , vol.12 , Issue.11 , pp. 861-866
    • Van Der Ziel, A.1
  • 9
    • 4444302438 scopus 로고    scopus 로고
    • The influence of the gate leakage current and the gate resistance on the noise and gain performances of 90-nm CMOS for micro- and millimeter-wave frequencies
    • June
    • H.-O. Vickes, M. Ferndahl, A. Masud and H. Zirath, "The Influence of the Gate Leakage Current and The Gate Resistance on The Noise and Gain Performances of 90-nm CMOS for Micro- and Millimeter-Wave Frequencies", IEEE MTT-S IMS, pp. 971-974, June 2004.
    • (2004) IEEE MTT-S IMS , pp. 971-974
    • Vickes, H.-O.1    Ferndahl, M.2    Masud, A.3    Zirath, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.