Growth and characterization of Zn 1-x Cd x O films using remote plasma MOCVD

Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 381-384

  Ishihara, Junji ^a   Nakamura, Atsushi ^a   Shigemori, Satoshi ^a   Aoki, Toru ^a   Temmyo, Jiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Diethyl zinc; Dimethyl cadmium; Remote plasma enhanced metalorganic chemical vapor deposition; Zn 1 x Cd x O

Indexed keywords

CATHODES; COMPOSITION; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; ORGANIC SOLVENTS; PHOTOLUMINESCENCE; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS; ZINC COMPOUNDS;

DIETHYL ZINC; DIMETHYL CADMIUM; REMOTE PLASMA ENHANCED METALORGANIC CHEMICAL VAPOR DEPOSITION; ZN1-XCDXO;

THIN FILMS;

EID: 15844417251     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.094     Document Type: Conference Paper

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