Monte Carlo calculations for metal-semiconductor hot-electron injection via tunnel-junction emission

Physical Review B - Condensed Matter and Materials Physics

Volumn 71, Issue 4, 2005, Pages

  Appelbaum, Ian ^a,b,d   Narayanamurti, V ^c  

^a HARVARD UNIVERSITY   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c HARVARD UNIVERSITY   (United States)

^d UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; ELECTRON; ELECTRON MICROSCOPY; FLAME PHOTOMETRY; MONTE CARLO METHOD; SEMICONDUCTOR;

EID: 15744400075     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.71.045320     Document Type: Article

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