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Volumn 44, Issue 1 A, 2005, Pages 75-81

Structural studies of high-performance low-k dielectric materials improved by electron-beam curing

Author keywords

Cu damascene; EB curing; EXAFS; Ladder structure; Low k dielectric; Methylsilsesquioxane; Random structure; XAFS; XANES

Indexed keywords

ABSORPTION; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CURING; ELECTRON BEAMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

EID: 15544366132     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.75     Document Type: Article
Times cited : (16)

References (20)
  • 18
    • 0004133516 scopus 로고    scopus 로고
    • Gaussian, Inc., Pittsburgh PA
    • GAUSSIAN98, Revision A.11, Gaussian, Inc., Pittsburgh PA, 2001.
    • (2001) GAUSSIAN98, Revision A.11


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.