Interpretation of dominant impurities in Cu films by secondary ion mass spectrometry and glow discharge mass spectrometry

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 1 A, 2005, Pages 373-374

  Lim, Jae Won ^a   Bae, Joon Woo ^a   Mimura, Kouji ^a   Isshiki, Minoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Copper; GDMS; Impurity; Ion beam; SIMS; Thin film

Indexed keywords

ELECTRIC POTENTIAL; ELECTROMIGRATION; GLOW DISCHARGES; ION BEAMS; PRESSURE EFFECTS; SCHEMATIC DIAGRAMS; SECONDARY ION MASS SPECTROMETRY; SILICON; THIN FILMS;

BULK RESISTIVITY; DOMINANT IMPURITY ELEMENTS; GLOW DISCHARGE MASS SPECTROMETRY (GDMS); TRACE IMPURITIES;

COPPER;

EID: 15544362252     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.373     Document Type: Article

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