Preparation of high-purity Cu films by non-mass separated ion beam deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 371-376

  Lim, J W ^a   Mimura, K ^a   Miyake, K ^b   Yamashita, M ^c   Isshiki, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

^c Seinan Industries Co Ltd   (Japan)

Author keywords

Bias voltage; Copper; Impurity; Ion beam; Purification; Secondary ion mass spectrometry

Indexed keywords

COPPER; CRYSTAL ORIENTATION; ION BEAM ASSISTED DEPOSITION; POSITIVE IONS; SECONDARY ION MASS SPECTROMETRY;

BIAS VOLTAGES;

METALLIC FILMS;

EID: 0038751823     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00765-1     Document Type: Conference Paper

References (14)

1. Aisenberg S., Chabot R. J. Appl. Phys. 42:1971;2953.
2. Miyake K., Ohashi K. Nucl. Instr. and Meth. B. 121:1997;102.
3. Miyake K., Ohashi K. Mater. Chem. Phys. 54:1998;321.
4. K. Miyake, Y. Ishikawa, M. Yamashita, M. Isshiki, Proc. of 2000 Int. Conf. on Ion Implantation Tech., 2000, p. 550.
5. Amano J., Bryce P., Lawson R.P.W. J. Vac. Sci. Technol. 12:1976;591.
6. Amano J., Bryce P., Lawson R.P.W. J. Vac. Sci. Technol. 15:1978;118.
7. Yamashita M. Jpn. J. Appl. Phys. 26:1987;721.
8. Miyake K., Ohashi K. Jpn. J. Appl. Phys. 32:1993;L120.
9. Vook R.W. Thin Solid Films. 305:1997;286.
10. Lim J.-W., Ishikawa Y., Miyake K., Yamashita M., Isshiki M. Mater. Trans., JIM. 43:2002;1403.
11. Lim J.-W., Ishikawa Y., Miyake K., Yamashita M., Isshiki M. Mater. Trans., JIM. 43:2002;478.
12. Stroms H.A., Brown K.F., Stein J.D. Anal. Chem. 49:1977;2023.
13. Takagi T. Thin Solid Films. 92:1982;1.
14. Coburn J.W., Kay E. Appl. Phys. Lett. 18:1971;435.