|
Volumn 3155, Issue , 1997, Pages 146-154
|
A compact electrostatic lithography column for nanoscale exposure
a b b b b |
Author keywords
Aberrations; Boersch; Deflection; Electron optics; Electrostatic; Lenses
|
Indexed keywords
ABERRATIONS;
CHARGED PARTICLES;
ELECTRON OPTICS;
ELECTRON-ELECTRON INTERACTIONS;
ELECTROSTATIC LENSES;
ELECTROSTATICS;
LENSES;
OPTICAL INSTRUMENTS;
BEAM COLUMNS;
BOERSCH;
COMPUTER MODELLING;
DEFLECTION;
ELECTRODE ASSEMBLIES;
ELECTRON INTERACTIONS;
ELECTROSTATIC;
NANO SCALING;
ELECTRONS;
|
EID: 15444346073
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.287810 Document Type: Conference Paper |
Times cited : (1)
|
References (5)
|