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Volumn 3155, Issue , 1997, Pages 146-154

A compact electrostatic lithography column for nanoscale exposure

Author keywords

Aberrations; Boersch; Deflection; Electron optics; Electrostatic; Lenses

Indexed keywords

ABERRATIONS; CHARGED PARTICLES; ELECTRON OPTICS; ELECTRON-ELECTRON INTERACTIONS; ELECTROSTATIC LENSES; ELECTROSTATICS; LENSES; OPTICAL INSTRUMENTS;

EID: 15444346073     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.287810     Document Type: Conference Paper
Times cited : (1)

References (5)
  • 1
    • 0009337973 scopus 로고
    • Electron optical performance of a scanning tunneling microscope controlled field emission microlens system
    • T.H.P.Chang, D.P.Kern and M.A.McCord, "Electron optical performance of a scanning tunneling microscope controlled field emission microlens system", J.Vac.Sci.Technol. B7 (6), pp1855-1861, 1989
    • (1989) J.Vac.Sci.Technol , vol.B7 , Issue.6 , pp. 1855-1861
    • Chang, T.H.P.1    Kern, D.P.2    McCord, M.A.3
  • 2
    • 4143056630 scopus 로고    scopus 로고
    • Munro's Electron Beam Software Ltd, London, April
    • BOERSCH User Manual, Version 1.7C, Munro's Electron Beam Software Ltd., London, April 1996.
    • (1996) BOERSCH User Manual, Version 1.7C
  • 3
    • 0026839468 scopus 로고
    • Conceptual Models for Understanding and Mimimizing Coulomb Interactions
    • A.D.Brodie and W.D.Meisburger, "Conceptual Models for Understanding and Mimimizing Coulomb Interactions", Microelectronic Engineering, 17, (1992) 399-404
    • (1992) Microelectronic Engineering , vol.17 , pp. 399-404
    • Brodie, A.D.1    Meisburger, W.D.2
  • 4
    • 0004032298 scopus 로고    scopus 로고
    • T.Chisholm, H.Liu, E.Munro, J.Rouse and X.Zhu, A Compact Electrostatic Lithography Column for Nanoscale Exposure, to be published in J.Vac.Sci.Technol. B, Nov/Dec 1997
    • T.Chisholm, H.Liu, E.Munro, J.Rouse and X.Zhu, "A Compact Electrostatic Lithography Column for Nanoscale Exposure", to be published in J.Vac.Sci.Technol. B, Nov/Dec 1997
  • 5
    • 0029697463 scopus 로고    scopus 로고
    • Addition of different contributions to the charged particle probe size
    • J.E.Barth and P.Kruit, "Addition of different contributions to the charged particle probe size", Optik, 101, 3, (1996) 101-109
    • (1996) Optik , vol.101 , Issue.3 , pp. 101-109
    • Barth, J.E.1    Kruit, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.