Compact electrostatic lithography column for nanoscale exposure

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2702-2706

  Chisholm, Tom ^a   Liu, Haoning ^b   Munro, Eric ^b   Rouse, John ^b   Zhu, Xieqing ^b  

^a Leica Lithography Systems Ltd   (United Kingdom)

^b Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004032298     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589711     Document Type: Article

References (4)

1. T. H. P. Chang, D. P. Kern, and M. A. McCord, J. Vac. Sci. Technol. B 7, 1855 (1989).
2. BOERSCH User Manual, Version 1.7C (Munro's Electron Beam Software Ltd., London, 1996).
3. A. D. Brodie and W. D. Meisburger, Microelectron. Eng. 17, 399 (1992).
4. J. E. Barth and P. Kruit, Optik (Stuttgart) 101, 101 (1996).