A Study of Photoelectron Emission Microscopy Contrast Mechanisms Relevant to Microelectronics

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2002, Pages 47-54

  Ballarotto, Vincent ^a   Siegrist, Karen ^a   Williams, Ellen ^a   Vanderlinde, William ^a  

^a LABORATORY FOR PHYSICAL SCIENCES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LOGIC ARRAYS; PHOTOELECTRON EMISSION MICROSCOPY (PEEM);

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DATA REDUCTION; DOPING (ADDITIVES); EDGE DETECTION; ELECTRON EMISSION; ELECTRON MICROSCOPY; FAILURE ANALYSIS; IMAGING TECHNIQUES; LIGHT SOURCES; PHOTOLITHOGRAPHY; PHOTONS;

MICROELECTRONICS;

EID: 1542270650     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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