Highly sensitive two-photon chromophores applied to three-dimensional lithographic microfabrication: Design, synthesis and characterization towards two-photon absorption cross section

Journal of Materials Chemistry

Volumn 14, Issue 1, 2004, Pages 75-80

  Lu, Youmei ^a   Hasegawa, Fuyuki ^a   Goto, Takamichi ^b   Ohkuma, Satoshi ^b   Fukuhara, Setsuko ^a   Kawazu, Yukie ^a   Totani, Kenro ^a   Yamashita, Takashi ^b   Watanabe, Toshiyuki ^a  

^a Division of Applied Chemistry   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AROMATIC COMPOUNDS; POLYMERS; SYNTHESIS (CHEMICAL);

PROTON CHROMOPHORES;

PHOTONS;

BENZALDEHYDE; IMINO ACID; MONOMER;

ABSORPTION; ARTICLE; CHEMICAL BOND; CHEMICAL REACTION; CHROMATOPHORE; DEHYDRATION; IMAGING; INFORMATION; LIGHT ABSORPTION; NEUTRON RADIATION; PHOTON; PHOTOSENSITIVITY; QUANTUM MECHANICS; SYNTHESIS;

EID: 0942301266     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b309023j     Document Type: Article

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