High power generators for medium frequency sputtering applications

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 50-53

  Rettich, T ^a   Wiedemuth, P ^a  

^a Huttinger Elecktron GmbH Co KG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CATHODES; GLASS; INSULATING MATERIALS; SILICA; TIN COMPOUNDS; TITANIUM DIOXIDE;

MEDIUM FREQUENCY GENERATORS; REACTIVE SPUTTERING; SINE WAVE GENERATORS;

MAGNETRON SPUTTERING;

EID: 0031549379     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00131-2     Document Type: Article

References (7)

1. Schiller, Goedicke, Kirchhoff, Kopte, 'Pulsed technology: A new era of magnetron sputtering', 38th Annual Technical Conf. Proc., SVC, 1995.
2. Kirchhoff, Kopte, Winkler, Schulze, Wiedemuth, 'Dual magnetron sputtering system (DMS) with sine-wave power supply for large-area coating', 5th Conf. on Plasma Surface Engineering, PSE, 1996.
3. Kirchhoff, Kopte, 'High-power pulsed magnetron sputter technology', 39th Annual Technical Conf. Proc., SVC, 1996, p. 117-122.
4. Schiller, Goedicke, Reschke, Kirchhoff, Schneider, Milde, Surf. Coat. Technol. 61 (1993) 331.
5. Leybold, TwinMag, product literature, 1996.
6. Hüttinger Elektronik, TIG P Series, product literature, 1996.
7. Von Ardenne Anlagentechnik, Dual Magnetron Sputter Source, product literature, 1996.