Development of a femtosecond micromachining workstation by use of spectral interferometry

Optics Letters

Volumn 30, Issue 4, 2005, Pages 373-375

  Bera, Sudipta ^a   Sabbah, A J ^a   Durfee, Charles G ^a   Squier, Jeff A ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTOSECOND MICROMACHINING; OSCILLATOR PULSES; SPECTRAL INTERFEROMETRY; THIN METAL FILMS;

AMPLIFICATION; CHARGE COUPLED DEVICES; DIELECTRIC MATERIALS; INTERFEROMETRY; LASER APPLICATIONS; OPTIMIZATION; SEMICONDUCTOR MATERIALS; THIN FILMS;

MICROMACHINING;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; INDUSTRY; INSTRUMENTATION; INTERFEROMETRY; LASER; MATERIALS; METHODOLOGY; SPECTROSCOPY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INDUSTRY; INTERFEROMETRY; LASERS; MANUFACTURED MATERIALS; SPECTRUM ANALYSIS;

EID: 14544279768     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.30.000373     Document Type: Article

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